IAP Course: A brief introduction to e-beam lithography
Tuesday, January 17, 2023 at 2:00pm to 3:30pm
MIT.nano , 0168 Building 12
E-beam lithography enables advanced semiconductor chips; without e-beam lithography minimum features sizes would be limited to approximately 200 nm. In research environments e-beam lithography allows direct write, mask less lithography enabling quick and relatively cheap design changes.
This talk introduces the basics of e-beam lithography and pattern transfer, including electron energy, material interaction, limits to resolution, e-beam resists, throughput, proximity effect correction and characteristics of different e-beam lithography tools.
Anyone with an interest in e-beam lithography, from neophyte, to experienced user should be able to gain something from this talk.
Instructors: Mark Mondol, Assistant Director Nano Structures Laboratory; and Juan Ferrera, Research Scientist
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Registration deadline: January 16, 2023
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