Thursday, January 18, 2024 | 1pm to 2:30pm
About this Event
Building 12
https://mitnano.mit.edu/mitnano-2024-iap-courses ##MITIAP #IAP2024 #MIT.nano #MIT.nanoIAP2024E-beam lithography enables advanced semiconductor chips; without e-beam lithography minimum features sizes would be limited to approximately 200 nm. In research environments e-beam lithography allows direct write, maskless lithography enabling quick and relatively cheap design changes.
This talk introduces the basics of e-beam lithography and pattern transfer, including electron energy, material interaction, limits to resolution, e-beam resists, throughput, proximity effect correction, and characteristics of different e-beam lithography tools.
Anyone interested in e-beam lithography, from neophyte to experienced users should be able to gain something from this talk.
Instructors: Mark Mondol, Assistant Director of Nano Structures Laboratory; Juan Ferrera, Research Scientist
Registration is now closed
Registration deadline: January 17, 2024
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