IAP Course: A brief introduction to e-beam lithography

Tuesday, January 17, 2023 at 2:00pm to 3:30pm

MIT.nano , 0168 Building 12

E-beam lithography enables advanced semiconductor chips; without e-beam lithography minimum features sizes would be limited to approximately 200 nm. In research environments e-beam lithography allows direct write, mask less lithography enabling quick and relatively cheap design changes.

This talk introduces the basics of e-beam lithography and pattern transfer, including electron energy, material interaction, limits to resolution, e-beam resists, throughput, proximity effect correction and characteristics of different e-beam lithography tools.

Anyone with an interest in e-beam lithography, from neophyte, to experienced user should be able to gain something from this talk.

Instructors: Mark Mondol, Assistant Director Nano Structures Laboratory; and Juan Ferrera, Research Scientist

This registration is closed

Registration deadline: January 16, 2023 

Event Type

IAP (Independent Activities Period)

Events By Interest

IAP (Independent Activities Period), General

Events By Audience

MIT Community, Students, Alumni, Faculty, Staff

Events By School

School of Engineering (SoE), School of Science


research, engineering, science, nanotechnology, MIT, IAP, Nanoscience, nanoscale




##MITIAP #IAP2023 #MIT.nano #MIT.nanoIAP2023

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