IAP Course: A brief introduction to e-beam lithography

E-beam lithography enables advanced semiconductor chips; without e-beam lithography minimum features sizes would be limited to approximately 200 nm. In research environments e-beam lithography allows direct write, mask less lithography enabling quick and relatively cheap design changes.

This talk introduces the basics of e-beam lithography and pattern transfer, including electron energy, material interaction, limits to resolution, e-beam resists, throughput, proximity effect correction and characteristics of different e-beam lithography tools.

Anyone with an interest in e-beam lithography, from neophyte, to experienced user should be able to gain something from this talk.

Instructors: Mark Mondol, Assistant Director Nano Structures Laboratory; and Juan Ferrera, Research Scientist

This registration is closed

Registration deadline: January 16, 2023