Opportunities and challenges in metrology for emerging technologies

Date: Thursday, June 15, 2023
Location: 12-0168 (MIT.nano basement)
Time: 11 a.m. – 1 p.m. ET
Lunch will be provided.

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ABSTRACT

There are many challenges associated with the development of characterization and metrology capabilities for advanced semiconductor development and manufacturing. As such, this has been deemed a key focus area for the recently implemented CHIPS Act. We will discuss the general metrology landscape and challenges, with a particular focus on lab-to-fab opportunities with X-ray metrologies.

Rigaku Semiconductor Metrology Division specializes in providing WD-XRF, XRR, ED-XRF and optical, TXRF, XRD, HR-XRD, and CD-SAXS metrology tools to measure critical process parameters, including thickness, composition, density, roughness, surface contamination, crystallite size, stress/strain, CD, shape, and more. 

In this talk, Rigaku representatives will outline solutions for process R&D and high-volume manufacturing of semiconductors and micro-electronics.

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MIT.nano Tool Talks are designed to introduce the latest transformative technologies, tools, methods and science advancements.

Tool Talks are sponsored by individual tool suppliers but geared toward the entire MIT community—applicable to a generalized scientific audience from materials science to electrical engineering, applied physics to biology and medicine, mechanical engineering to environmental science and more—for broadest impact and to provide educational value for all levels of students, postdocs, staff, faculty, and collaborators.